- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/004 - Photosensitive materials
Patent holdings for IPC class G03F 7/004
Total number of patents in this class: 8634
10-year publication summary
|
521
|
557
|
564
|
558
|
572
|
620
|
632
|
637
|
705
|
252
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 27102 |
1787 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
508 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
498 |
| JSR Corporation | 2476 |
485 |
| Sumitomo Chemical Company, Limited | 8808 |
275 |
| Toray Industries, Inc. | 6652 |
238 |
| Hitachi Chemical Company, Ltd. | 2455 |
162 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
160 |
| Rohm and Haas Electronic Materials LLC | 637 |
140 |
| Samsung SDI Co., Ltd. | 6671 |
127 |
| Taiyo Ink Mfg. Co., Ltd. | 219 |
114 |
| LG Chem, Ltd. | 17205 |
112 |
| Mitsubishi Chemical Corporation | 4313 |
100 |
| Mitsubishi Gas Chemical Company, Inc. | 3188 |
98 |
| Samsung Electronics Co., Ltd. | 131630 |
90 |
| Nissan Chemical Industries, Ltd. | 1822 |
86 |
| Merck Patent GmbH | 5909 |
76 |
| Tokyo Electron Limited | 11599 |
73 |
| Boe Technology Group Co., Ltd. | 35384 |
67 |
| Central Glass Company, Limited | 1244 |
66 |
| Other owners | 3372 |